ABSTRACT: Al Doped CoO thin film [ACO] were successfully deposited on amorphous glass substrates using Successive Ionic Layer Adsorption and Reaction deposition method [SILAR]. The deposited film were annealed at temperature of 300oC and the annealed time varied for 1hr, 1hr.15mins, 1hr.30mins, 1hr.45mins and 2hrs. Thin films of ACO were deposited on glass by successive immersion of the substrate into a complex (NH4) AlCoCl2 bath kept at room temperature. 3ml of 3M solution of ammonia (NH4) used as a complexing agent was measures and added into a beaker with 40.0g of 0.6M of CoCl to form a complex cobalt ion, 10% of AlCl2 was also measured and added as a dopant....
Keywords: [Aluminum, Cobalt oxide, thin films, Annealing time,]
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